For some cases it would be helpfull to define a focused mask (as in 3D refinement) when determining the pose difference after symmetry relaxation.
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Yes 100% agree, this would be great! Or add sym relaxation as an option to local refinement
Yes I suppose that is a simlar option. This would really help for cases wehre there is a minor contributing assymetric coponent to an overall larger symmetric strcture.
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Yes - or different local symmetries, symmetry relaxation in subparticles, etc
Hi all,
Thank you for the feature requests! This is recorded as a future addition
Michael
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Thanks. Good to know.