For some cases it would be helpfull to define a focused mask (as in 3D refinement) when determining the pose difference after symmetry relaxation.
Yes 100% agree, this would be great! Or add sym relaxation as an option to local refinement
Yes I suppose that is a simlar option. This would really help for cases wehre there is a minor contributing assymetric coponent to an overall larger symmetric strcture.
Yes - or different local symmetries, symmetry relaxation in subparticles, etc
Thank you for the feature requests! This is recorded as a future addition
Thanks. Good to know.