I do have very basic question regarding mask making for local refinement described in the tutorial for yeast U4/U6.U5 tri-snRNP because I am simply confused and need some clarification.
Should a mask include “mask” that wraps the domain of interest to be locally refined and also the negative mask that wraps the region to be removed?
In other words, to locally refine a particular density, you need not only to make a make that covers the density of interest. At the same time, you need to make “negative” density mask that corresponds to a density that you like to remove during local refinement?
Thanks for your help.