4.4 release kudos and question

I just have to say, this new release looks very impressive! Very excited to try some of this stuff out. I also caught the bit about using classification results to improve the reference-based particle polishing, and it made me wonder: would something similar benefit higher-order CTF aberration fitting? Anyways, this release is awesome, many thanks for all the great work!


Hi @yoshiokc, thanks for the feature suggestion! We’ve recorded it. There may be some benefit to doing this, but since there’s usually more signal in an exposure group’s worth of particles than in a single micrograph’s worth of particles, the effect may be less significant than in the motion correction case. Regardless, it is an interesting suggestion.

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