Hi,
Currently it is possible to generate a mask in cryoSPARC, but using it effectively for refinement doesn’t seem possible, unless I am missing something (which is entirely possible, or perhaps likely!).
I am assuming, that if one is refining with a user supplied mask, that the correct option to set for masking is “static”. But if I do that, the results I get are really bad - all kinds of masking artifacts, I am assuming because the mask is being applied from the very beginning of refinement.
I think it might make more sense to allow the user to choose when to apply the generated mask - e.g. at a particular resolution, or at convergence of dynamic masking. I’ve tried playing around with the threshold for dynamic masking, but that has the same issue - a threshold that is appropriate for masking out the micelle/nanodisc in later iterations seems too tight in early iterations. Suggestions/tips welcome!
Cheers
Oli